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Antistatic Summer Clothing

Developer

For removing exposed resist during the positive photofabrication process.

  • Disolves exposed photoresist
  • Concentrated formulation - dilute one part developer to ten parts water
  • For best results, use in conjunction with cat# 416-S foam brush.
  • Also available in the 416-K Photofabrication Kit.
Part Number Mfr. Part # Sizes Available Description
MG-418-500ML 418-500ML 500ml (16 oz) Liquid
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MSDS Liquid

AppGuide

 

The MG Chemicals Prototyping Process

This product is a part of the MG Chemicals Prototyping Process. The following materials are required for the entire process:

> Transparency Paper
> Copper Clad Boards
> Exposure Kit
> Photofabrication Kit
> Etching Process Kit
> One of our etchants:
Ferric Chloride
Sodium Persulphate
Ammonium Persulphate

 

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Order Now Part Number Description Price
USD
MG-418-500ML POSITIVE PHOTO RESIST DEVELOPER, 17 oz
Qty1 +
Price$10.95